Equipment & Manuals

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Facility Equipment

Mask Aligner SUSS MJB3 (Manual)

This aligner is equipped with a 350W UV mercury high pressure lamp and can resolve features to a few microns (0.6 micron under optimum conditions), on substrates up to 3 inches in diameter. The usable wavelengths are 365nm and 405nm. The system has 3 available contact modes: soft, hard, and high pressure. (It is required to schedule and attend a specific training in order to use this equipment)

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Technics Plasma etcher 500-II (Manual)

This plasma system is a RF plasma reactor equipped with stainless steel chamber 500 watt, 13.56 MHz RF generator, and on gas supplies, O2. The equipment is able to process any size of samples that are smaller than 6in diameter. Some applications include: photoresist stripping, surface cleaning, and O2 plasma surface treatment on Si or other substrates such as ceramic, metal, plastic, and glass.  (It is required to schedule and attend a specific training in order to use this equipment)

 

 


Headway spin coater (Manual)

 

The Reynolds Tech general purpose fume hood is equipped with a Headway Research spin coater/controller, various spinner chuck sizes for pieces through 6in or smaller, N2 drying guns, water guns and a photoresist/solvent disposal drains.(You require to attend and schedule a specific training in order to use this equipment).

Visit manufacturer’s website

 

 


Profilometer (Manual) 

This equipment measures the vertical depth of a material across a specified horizontal length. The profile is displayed on a printable graphical interface.Some applications include measuring deposited film thickness, surface roughness and surface features. (You require to attend and schedule a specific training in order to use this equipment).

Visit manufacturer’s website
 


 

Laurell spin coater (Manual)

Equipment used mainly for coating thin layers of PDMS. It can process wafer from 2”- 6” diameter and small wafer fragments or glass.  Maximum speed is 8000 rpm. This spinner is mainly intended to be used for PDMS or other non corrosive polymer spinning process. (It is required to schedule and attend a specific training in order to use this equipment).

Visit manufacturer’s website

 


Jelight UVO-Cleaner 42 (Manual)

This equipment relies on UV and Ozone to clean organic from the surfaces of the substrates. It has a maximum tray capacity of 6.5 x 6.5in.

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Alignment Station

This homemade tool is equipped with The Greenough stereo microscope LEICA S8APO and a cold light source KL 1500LCD.

This equipment is used for achieving precise PDMS device bonding to other materials or substrates.
 


 

THINKY ARE-250 Mixer (Manual)

This equipment is a planetary centrifugal mixer that is used to mix and de-gas viscous mixtures of different polymers such as PDMS. (It is required to schedule and attend a specific training in order to use this equipment)

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THERMAL EVAPORATOR- Sharon (Manual)

 

This equipment is a dual-source thermal evaporation system with 2.5-kW power supply for depositing thin films of metal. The system is equipped with a high current switch that enables sequential deposition of two materials without breaking vacuum in addition to a quartz crystal monitor for manual thickness control. The chamber base pressure is around  5x10-7 Torr range.

(It is required to schedule and attend a specific training in order to use this equipment)

 

 

 


(NEW) PDMS PORT CREATOR

 

This is a high precision instrument for making perfect and aligned microfluidic ports. It comprises an integrated camera, an autimated system to eject the removed material from the coring needle and an integrated X/Y transalational stage, which simplifies the alignment of the device to the coring needle.

The equipment offers:

Excellent process control (same size ports)

Easy alignment and precision.

All ports are created totally perpendicular to the surface of the device.

Sharp cuts, minimal 

 

 

 

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